STRUCTURE OF ULTRATHIN FILMS OF FE ON CU (111) AND CU (110)

被引:88
作者
TIAN, D [1 ]
JONA, F [1 ]
MARCUS, PM [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
PHYSICAL REVIEW B | 1992年 / 45卷 / 19期
关键词
D O I
10.1103/PhysRevB.45.11216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A study of the growth of Fe on Cu{111} and on Cu{110} has been carried out with low-energy electron diffraction (LEED) and Auger electron spectroscopy. We find that on Cu{111}, Fe grows first pseudomorphically as gamma-Fe{111} to a thickness of about five layer equivalents (LE), and then forms six bcc Fe{110} domains rotationally related in the Kurdjumov-Sachs orientation. The pseudomorphic film has the same bulk interlayer spacing, within experimental error, as the Cu{111} substrate (2.08 +/- 0.03 angstrom) and a slightly contracted first interlayer spacing (2.03 +/- 0.03 angstrom). With increasing thickness more and more defects are introduced in the film, but a 13-LE film still produces a good LEED pattern. On Cu{110}, the Fe film grows also pseudomorphically, with the same bulk interlayer spacing as the substrate (1.27 angstrom) and a contracted first interlayer spacing (1.17 angstrom), but a precise structure analysis is not possible because the film has relatively large {111} facets. Defects and disorder increase with film thickness, so that the LEED pattern is practically obliterated when the thickness exceeds about 20 LE.
引用
收藏
页码:11216 / 11221
页数:6
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