INP-BASED HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS WITH HIGH-QUALITY SHORT-PERIOD (INAS)(3M)/(GAAS)(1M) SUPERLATTICE CHANNEL LAYERS

被引:5
作者
AUER, U
REUTER, R
HEEDT, C
PROST, W
TEGUDE, FJ
机构
[1] Solid State Electronics Department, Sonderforschungsbereich SFB 254, Gerhard-Mercator-Universität GH Duisburg, Duisburg, D-47057
关键词
D O I
10.1016/0022-0248(95)80134-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
InP-based heterostructure field-effect transistors (HFETs) incorporating an (InAs)(3m)/(GaAs)(1m) short-period superlattice (SPSL) subchannel are compared to HFETs using a ternary In0.77Ga0.23As alloy with respect to transport and device performance. Room temperature Hall mobility of 13100 cm(2)/V . s was measured on a (InAs)(3)/(GaAs)(1) SPSL with a two-dimensional electron sheet density of 3.1x10(12) cm(-2), which are the highest mobilities in such a material system so far. Sheet resistances as low as 35 Omega(square), at 17 K confirm the high quality of the (InAs)(3)/(GaAs)(1) SPSL channel material resulting in high transit and unilateral gain cut-off frequencies of 63 and 190 GHz, respectively, in HFETs exhibiting gate lengths of 0.65 mu m. Nevertheless, a significant improvement compared to the ternary alloy could not be verified.
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收藏
页码:1225 / 1229
页数:5
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