INTEGRATED-OPTICS COMBINED WITH MICROMECHANICS ON SILICON

被引：30

作者：

BEZZAOUI, H

VOGES, E

机构：

[1] Universität Dortmund

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1991年 / 29卷 / 03期

关键词：

D O I：

10.1016/0924-4247(91)80018-K

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The combination of integrated optics and micromechanics on silicon offers new integration potentials for sensor applications. Silicon oxinitride (SiON) optical strip waveguides are fabricated by low-temperature (570 K) PECVD and RIE processes on microbridges, cantilevers and resonators based on field oxide. The single-mode strip waveguides with a refractive index n = 1.52 of the SiON layer show 0.5 dB/cm attenuation at 0.633-mu-m wavelength. The micromechanical elements are delineated by anisotropic KOH etching. They are built up with SiO2-SiON-SiO2 triple layers and exhibit low internal stress.

引用

页码：219 / 223

页数：5

共 20 条

[1] BAWLING RA, 1985, J ELECTROCHEM SOC, V132, P141
[2] BEZZAOUI H, 1990, OCT P OPTO 7 NURNB, P134
[3] BEZZAOUI H, 1990, MICRO SYSTEM TECHNOL, P283
[4] CLAASEN WAP, 1986, J ELECTROCHEM SOC, V33, P1458
[5] CLAEYS CL, 1988, SI SIO2 SYSTEM, P129
[6] GROSCH G, 1990, SENSOR ACTUAT A-PHYS, V21, P1128
[7] LOW-LOSS SI3N4-SIO2 OPTICAL WAVE-GUIDES ON SI
HENRY, CH
KAZARINOV, RF
LEE, HJ
ORLOWSKY, KJ
KATZ, LE
[J]. APPLIED OPTICS, 1987, 26 (13): : 2621 - 2624
[8] KNALE WR, 1988, J ELECTROCHEM SOC, V135, P1211
[9] Kogelnik H., 1988, GUIDED WAVE OPTOELEC, P7
[10] MOSER D, 1990, SENSOR ACTUAT A-PHYS, V21, P1019

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