LOW-PRESSURE DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE

[1] BROWN WA, 1979, SOLID STATE TECHNOL, V22, P51

[2] NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .1. SIH4-HCL-H2 SYSTEM AT HIGH-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 194 - 202

[3] CLAASSEN WAP, UNPUBLISHED

[4] EVERSTEIJN FC, 1971, PHILIPS RES REP, V26, P134

[5] POLYSILICON GROWTH-KINETICS IN A LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION REACTOR [J]. THIN SOLID FILMS, 1979, 59 (02) : 231 - 247

[6] MODELING OF LOW-PRESSURE DEPOSITION OF SIO2 BY DECOMPOSITION OF TEOS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 658 - 662

[7] STRUCTURE AND STABILITY OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (06) : 927 - 932

[8] KINETICS OF DECOMPOSITION OF AMORPHOUS HYDROGENATED SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) : 5238 - 5241

[9] GAS-PHASE NUCLEATION DURING THERMAL-DECOMPOSITION OF SILANE IN HYDROGEN [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 33 (01) : 1 - 7

[10] KINETICS AND MECHANISM OF THE SILANE DECOMPOSITION [J]. INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1979, 11 (11) : 1167 - 1182

[1] BROWN WA, 1979, SOLID STATE TECHNOL, V22, P51

[2] NUCLEATION OF CVD SILICON ON SIO2 AND SI3N4 SUBSTRATES .1. SIH4-HCL-H2 SYSTEM AT HIGH-TEMPERATURES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 194 - 202

[3] CLAASSEN WAP, UNPUBLISHED

[4] EVERSTEIJN FC, 1971, PHILIPS RES REP, V26, P134

[5] POLYSILICON GROWTH-KINETICS IN A LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION REACTOR [J]. THIN SOLID FILMS, 1979, 59 (02) : 231 - 247

[6] MODELING OF LOW-PRESSURE DEPOSITION OF SIO2 BY DECOMPOSITION OF TEOS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 658 - 662

[7] STRUCTURE AND STABILITY OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (06) : 927 - 932

[8] KINETICS OF DECOMPOSITION OF AMORPHOUS HYDROGENATED SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (08) : 5238 - 5241

[9] GAS-PHASE NUCLEATION DURING THERMAL-DECOMPOSITION OF SILANE IN HYDROGEN [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 33 (01) : 1 - 7

[10] KINETICS AND MECHANISM OF THE SILANE DECOMPOSITION [J]. INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1979, 11 (11) : 1167 - 1182