SIMULATION STUDIES OF SILICON ELECTROOPTIC WAVE-GUIDE DEVICES

被引:45
作者
GIGUERE, SR
FRIEDMAN, L
SOREF, RA
LORENZO, JP
机构
[1] WORCESTER POLYTECH INST,WORCESTER,MA 01609
[2] USAF,ROME AIR DEV CTR,ESOC,BEDFORD,MA 01731
关键词
D O I
10.1063/1.347082
中图分类号
O59 [应用物理学];
学科分类号
摘要
Several silicon-on-insulator guided-wave structures have been analyzed as potential electro-optic waveguide modulators using the pisces-ii two-dimensional (2D) device simulation program. From the electron and hole concentration data, the 2D refractive index profile is obtained. The profile is then spatially averaged with respect to a 2D cosine representation of the guided-wave E field to obtain the effective modal index changes at 1.3 and 1.55 μm. The channel-waveguide devices studied include the metal-oxide-semiconductor (MOS) diode, and the one or two-gate metal-oxide-semiconductor field-effect transistor (MOSFET) with single-or double-transverse injection. The single-gate double-injection MOSFET modulator offers the most promise with 10-3 refractive index changes possible, changes comparable in size to the Pockels effect in LiNbO3 or GaAs.
引用
收藏
页码:4964 / 4970
页数:7
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