EXPERIMENTAL DETECTION LIMITS IN SCANNING AUGER MICROSCOPY AT HIGH LATERAL RESOLUTION

被引:10
作者
CHAZELAS, J
CAZAUX, J
GILLMANN, G
LYNCH, J
SZYMANSKI, R
机构
[1] THOMSON CSF,F-91401 ORSAY,FRANCE
[2] INST FRANCAIS PETR,F-92506 RUEIL MALMAISON,FRANCE
关键词
Microscopic Examination--Scanning Electron Microscopy - Palladium and Alloys--Spectroscopic Analysis - Semiconducting Gallium Arsenide - Semiconducting Silicon--Spectroscopic Analysis - Spectroscopy; Auger Electron;
D O I
10.1002/sia.740120110
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using a scanning Auger microscope at 100 kev primary beam energy it has been possible to analyse a dispersed catalyst particle by particle. The elemental analysis of a 8 nm particle has been obtained for which the number of Pd atoms being detected is estimated to be less than 4000, leading to a detectable mass of 7×10-19g. A silicon sub-monolayer buried in a GaAs matrix has also been detected, operating at oblique incidence with a 20 nm beam size (minimum detectable concentration -3). These preliminary experiments illustrate the potential of performing Auger spectroscopy at unconventional primary beam energies (with a field emission gun) when high lateral resolution is required.
引用
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页码:45 / 48
页数:4
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