SENSITIVITY OF DIAZOQUINONE RESISTS TO OPTICAL AND ELECTRON-BEAM EXPOSURE

被引：5

作者：

KAPLAN, M

MEYERHOFER, D

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1980年 / 20卷 / 16期

关键词：

D O I：

10.1002/pen.760201607

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：1073 / 1076

页数：4

共 9 条

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[8] PHOTOCHEMICAL STUDIES ON A SUBSTITUTED NAPHTHALENE-2,1,DIAZO-OXIDE - FORMATION AND IDENTIFICATION OF A KETENE FROM A WOLFF REARRANGEMENT [J].

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