ELECTRON-BEAM NANOFABRICATION WITH SELF-ASSEMBLED MONOLAYERS OF ALKYLTHIOLS AND ALKYLSILOXANES

被引：28

作者：

LERCEL, MJ

REDINBO, GF

ROOKS, M

TIBERIO, RC

CRAIGHEAD, HG

SHEEN, CW

ALLARA, DL

机构：

[1] School of Applied and Engineering Physics, the National Nanofabrication Facility Cornell University, Ithaca

[2] Department of Materials Science, Department of Chemistry Pennsylvania State University, University Park

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0167-9317(94)00052-V

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.

引用

页码：43 / 46

页数：4

共 18 条

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