SYSTEM ZIRCONIA-HAFNIA

被引：144

作者：

RUH, R

GARRETT, HJ

DOMAGALA, RF

TALLAN, NM

机构：

[1] Aerospace Research Laboratories, Ofice of Aerospace Research, Ohio, Wright-Patterson Air Force Base

[2] University of Illinois at Chicago, Chicago, Illinois

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1968年 / 51卷 / 01期

关键词：

D O I：

10.1111/j.1151-2916.1968.tb11822.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The ZrO2‐HfO2 system was investigated by metallo‐graphic, X‐ray diffraction, and microprobe analysis using are‐melted samples which had been annealed and quenched. The monoclinic‐tetragonal inversion was investigated by DTA and high‐temperature X‐ray diffraction analysis. Results reveal that zirconia and hafnia are completely miscible in all proportions in the binary system. Within experimental error, the melting points of the compositions lie roughly on a straight line connecting the melting points of oxides. There is a continuous increase in the monoclinic‐tetragonal inversion temperature as the composition moves from ZrO2 to HfO2. The lattice parameters of the monoclinic phase follow smooth curves which have a negative deviation from Vegard's law. Copyright © 1968, Wiley Blackwell. All rights reserved

引用

页码：23 / +

页数：1

共 22 条

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