MODELING OF AN INDUCTIVELY COUPLED PLASMA AT REDUCED PRESSURES

被引:28
作者
PAIK, SH
PFENDER, E
机构
[1] Center for Plasma-Aided Manufacturing, Department of Mechanical Engineering, University of Minnesota, Minneapolis, 55455, Minnesota
关键词
modeling; Nonequilibrium plasma; RF plasma sintering;
D O I
10.1007/BF01460454
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Plasma sintering experiments in this laboratory at reduced pressures revealed efficient heating of the ceramic sample due to recombination of dissociated and/or ionized species on the surface. For establishing a model for this plasma sintering process, it is necessary to first consider the plasma itself. Therefore, a suitable model for an RF inductively coupled plasma has been developed considering reduced pressures. As the pressure decreases, the electron density also decreases at a fixed electron temperature, causing substantial deviations from chemical equilibrium. Due to the poor collisional coupling between electrons and heavy particles at reduced pressures, large deviations from kinetic equilibrium have also to be expected. The model is based on a rotationally symmetric plasma contained in a quartz tube. The power level ranges from 1.5 to 3 kW and the operating pressure is varied from 1 to 0.01 atm. Both deviations from chemical and kinetic equilibrium are included in this model. Thermodynamic and transport properties for two-temperature plasmas are used for this modeling work. The results indicate that for pressures below 0.1 atm, there is a strong ambipolar flux of charge carriers to the confining walls, leading to significant variations of the temperature across the tube. The electron temperature increases rapidly as the pressure decreases, whereas the heavy-particle temperature decreases. © 1990 Plenum Publishing Corporation.
引用
收藏
页码:167 / 188
页数:22
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