STUDIES OF METHYL METHACRYLATE-METHYL ALPHA-CHLOROACRYLATE COPOLYMERS AND POLY(METHYL ALPHA-CHLOROACRYLATE) AS ELECTRON SENSITIVE POSITIVE RESISTS

被引：14

作者：

LAI, JH ^{[1
]}

SHEPHERD, LT ^{[1
]}

ULMER, R ^{[1
]}

GRIEP, C ^{[1
]}

机构：

[1] HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420

来源：

POLYMER ENGINEERING AND SCIENCE | 1977年 / 17卷 / 06期

关键词：

D O I：

10.1002/pen.760170614

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：402 / 405

页数：4

共 12 条

[1] POLYMER NSR SPECTROSCOPY .2. THE HIGH RESOLUTION SPECTRA OF METHYL METHACRYLATE POLYMERS PREPARED WITH FREE RADICAL AND ANIONIC INITIATORS [J].

BOVEY, FA ;

TIERS, GVD .

JOURNAL OF POLYMER SCIENCE, 1960, 44 (143) :173-182

[2] POLY(ALKYL ALPHA-CHLOROACRYLATES) .5. PREPARATION AND PROPERTIES OF METHYL, ETHYL, AND ISOPROPYL POLYMERS OF VARIED TACTICITY [J].

DEVER, GR ;

KARASZ, FE ;

MACKNIGHT, WJ ;

LENZ, RW .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1975, 13 (09) :2151-2179

[3]

GIPSTEIN E, 1976, J ELECTROCHEM SOC, V23, P1105

[4] HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE [J].

HALLER, I ;

HATZAKIS, M ;

SRINIVASAN, R .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) :251-+

[5]

HATANO Y, 1975, PREPR AM CHEM SO AUG

[6] INCREASED RADIATION DEGRADATION IN METHYL-METHACRYLATE COPOLYMERS [J].

HELBERT, JN ;

WAGNER, BE ;

CAPLAN, PJ ;

POINDEXTER, EH .

JOURNAL OF APPLIED POLYMER SCIENCE, 1975, 19 (04) :1201-1203

[7] INVESTIGATION OF EFFECTS OF MOLECULAR-WEIGHT DISTRIBUTION ON SENSITIVITY OF POSITIVE ELECTRON RESISTS [J].

LAI, JH ;

SHEPHERD, L .

JOURNAL OF APPLIED POLYMER SCIENCE, 1976, 20 (09) :2367-2375

[8]

LAI JH, UNPUBLISHED RESULTS

[9] INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE [J].

LEVINE, AW ;

KAPLAN, M ;

POLINIAK, ES .

POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :518-524

[10]

MATSUZAKI K, 1969, MAKROMOLEKUL CHEM, V126, P292

← 1 2 →