PRESSURE STUDIES OF 4F AND 5F INTERMETALLICS WITH STRONG ELECTRONIC CORRELATIONS

被引：6

作者：

THOMPSON, JD

机构：

[1] Los Alamos National Laboratory, Los Alamos, NM

来源：

PHYSICA B | 1993年 / 190卷 / 01期

关键词：

D O I：

10.1016/0921-4526(93)90443-A

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The pressure response of strongly correlated 4f and 5f intermetallic compounds is reviewed briefly. Special attention is given to the similarities and differences among isostructural U-, Ce- and Yb-based analogues. In general, pressure favors reduced electronic correlations in U- and Ce-based materials, whereas the opposite holds for Yb-based systems. A simple model is discussed that qualitatively accounts for these observations.

引用

页码：61 / 67

页数：7

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