PHOTO-CHEMICAL DECOMPOSITION MECHANISMS FOR AZ-TYPE PHOTORESISTS

被引:95
作者
PACANSKY, J
LYERLA, JR
机构
关键词
D O I
10.1147/rd.231.0042
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The photochemical decomposition mechanism of orthonaphthoquinonediazides has been investigated principally by infrared and carbon-13 nuclear magnetic resonance spectroscopies. The results demonstrate that the decomposition proceeds via a ketene intermediate to a photoproduct, the nature of which depends on the reaction conditions. Model resist systems were prepared by mixing orthonaphthoquinonediazides and 2,3,6-trimethylphenol or the diazide plus Novolak resin. Under ambient thermal and humidity conditions, ultraviolet (UV) exposure of the diazide yields 3-indenecarboxylic acid as the final photoproduct. However, UV exposure in vacuo results in ester formation via a ketene-phenolic OH reaction. The decomposition pathway and ensuing reactions have been shown to be the same for both 1- and 3-orthonaphthoquinonediazides attached to mono- and trihydroxybenzophenones. The technological implications for resist processing derived from these studies are also discussed.
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页码:42 / 55
页数:14
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