STRUCTURAL-PROPERTIES OF HIGH-QUALITY SPUTTERED FE FILMS ON AL2O3(11(2)OVER-BAR0) AND MGO(001) SUBSTRATES

被引：22

作者：

MUHGE, T ^{[1
]}

STIERLE, A ^{[1
]}

METOKI, N ^{[1
]}

ZABEL, H ^{[1
]}

PIETSCH, U ^{[1
]}

机构：

[1] UNIV POTSDAM,FACHBEREICH PHYS,D-14469 POTSDAM,GERMANY

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1994年 / 59卷 / 06期

关键词：

D O I：

10.1007/BF00331928

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High-quality thin Fe films were deposited on MgO(001) and Al2O3(11 (2) over bar 0) substrates in the thickness range from 7 to 50 nm. The structural properties have been studied by out-of-plane and in-plane X-ray scattering experiments. From the out-of-plane measurements the electron density profile was determined together with interface and surface roughness parameters. Fe on Al2O3 grows along the [110]-direction with a structural coherence length comprising about the total film thick ness and a very small mosaicity. From in-plane scattering experiments a three-domain structure was observed. On MgO(001) substrates Fe grows in the [001]-direction, with the Fe [100]-axis parallel to the MgO [110]-axis. On both substrates, the Fe films exhibit a very small surface and interface roughness, indicative for a high quality of the sputtered samples.

引用

页码：659 / 665

页数：7

共 26 条

[1] MAGNETIZATION DIRECTION SWITCHING IN FE/CU(100) EPITAXIAL-FILMS - TEMPERATURE AND THICKNESS DEPENDENCE [J].