MICROMOTOR FABRICATION

被引:48
作者
MEHREGANY, M [1 ]
SENTURIA, SD [1 ]
LANG, JH [1 ]
NAGARKAR, P [1 ]
机构
[1] MIT,DEPT ELECT ENGN & COMP SCI,ELECTROMAGNET & ELECTR SYST LAB,MICROSYST TECHNOL LABS,CAMBRIDGE,MA 02130
基金
美国国家科学基金会;
关键词
D O I
10.1109/16.155878
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a detailed discussion of micromotor fabrication and related critical issues. The micromotors under study are of the variable-capacitance side-drive type with salient-pole and wobble (harmonic) designs. Polysilicon surface micromachining forms the basis of the micromotor fabrication process. In this process, LPCVD heavily phosphorus-doped polysilicon is used for the structural parts, LPCVD silicon nitride is used for electrical isolation, and CVD low-temperature oxide is used as the sacrificial material. The fabrication process impacts the performance characteristics of the micromotor through the reproduction accuracy of the design geometry and through the modification of the characteristics of contacting surfaces. Pattern definition and delineation are among the most critical steps of the micromotor fabrication process because of the increasing surface topography during fabrication and the large film thicknesses utilized. The release and testing process can affect the frictional characteristics of the micromotor significantly, determining success or failure of operation by dielectric excitation.
引用
收藏
页码:2060 / 2069
页数:10
相关论文
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