TiO2 Thin Films by Chemical Vapor Deposition: An XPS Characterization

被引：34

作者：

Barreca, Davide ^{[1
]}

Gasparotto, Alberto ^{[1
,2
,3
]}

Maccato, Chiara ^{[1
,2
,3
]}

Maragno, Cinzia ^{[1
,2
,3
]}

Tondello, Eugenio ^{[1
,2
,3
]}

机构：

[1] ISTM CNR & INSTM, Dept Chem, I-35131 Padua, Italy

[2] Univ Padua, Via Marzolo, I-35131 Padua, Italy

[3] INSTM, Dept Chem, I-35131 Padua, Italy

来源：

SURFACE SCIENCE SPECTRA | 2007年 / 14卷 / 01期

关键词：

TiO2; chemical vapor deposition; thin films; XPS;

D O I：

10.1116/11.20070902

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

As a part of a comprehensive research work on ZnO-TiO2 nanosystems synthesized by Chemical Vapor Deposition(CVD), we initially devoted our attention to the preparation and characterization of nanocrystalline TiO2 thin films. Specifically, the coatings were obtained by CVD on Si(100) substrates starting from (TiOPr)-O-(-Pr-i)(2)(dpm)(2)((OPr)-Pr-i=iso-propoxy; dpm=2,2,6,6-tetramethyl-3, 5-heptanedionate), under a dry O-2 atmosphere. The obtained samples were characterized by complementary techniques, namely Glancing Incidence X-ray Diffraction (GIXRD), X-ray Photoelectron Spectroscopy (XPS) and Scanning Electron Microscopy (SEM), for a thorough investigation of their microstructure, chemical composition and morphology. The present contribution is devoted to the XPS analysis of a TiO2 thin film obtained at 450 degrees C. Besides the wide scan spectrum, detailed spectra for the Ti 2p, O ls and C 1s regions and related data are presented and discussed. (C) 2007 American Vacuum Society .

引用

页码：27 / 33

页数：7

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