PHOTOELECTRON-SPECTROSCOPY OF UHV IN-SITU INTERCALATED LI/TISE2 EXPERIMENTAL PROOF OF THE RIGID BAND MODEL

被引：41

作者：

JAEGERMANN, W ^{[1
]}

PETTENKOFER, C ^{[1
]}

SCHELLENBERGER, A ^{[1
]}

PAPAGEORGOPOULOS, CA ^{[1
]}

KAMARATOS, M ^{[1
]}

VLACHOS, D ^{[1
]}

TOMM, Y ^{[1
]}

机构：

[1] UNIV IOANNINA,DEPT PHYS,GR-45110 IOANNINA,GREECE

来源：

CHEMICAL PHYSICS LETTERS | 1994年 / 221卷 / 5-6期

关键词：

D O I：

10.1016/0009-2614(94)00286-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Li was adsorbed at room temperature onto UHV cleaved TiSe2 (0001) van der Waals surfaces and investigated by soft X-ray photoelectron spectroscopy. The adsorbed Li is readily intercalated into the substrate without interface decomposition. The electronic structure of the intercalated phase is analyzed from the valence band spectra giving clear evidence that the intercalation follows the rigid band model. Shifts in the Fermi level and related changes in the work function are analyzed in terms of the electronic contribution of the free energy of intercalation.

引用

页码：441 / 446

页数：6

共 23 条

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