INFLUENCE OF CARBON ON THE ENHANCED OXYGEN LOSS IN COPPER-OXIDE FILMS

被引：24

作者：

LI, J

VIZKELETHY, G

REVESZ, P

MAYER, JW

MATIENZO, LJ

EMMI, F

ORTEGA, C

SIEJKA, J

机构：

[1] IBM CORP,DIV SYST TECHNOL,ENDICOTT,NY 13760

[2] UNIV PARIS 06,PHYS SOLIDES GRP,F-75005 PARIS,FRANCE

[3] UNIV PARIS 07,F-75251 PARIS 05,FRANCE

[4] HUNGARIAN ACAD SCI,CENT RES INST PHYS,H-1525 BUDAPEST,HUNGARY

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 12期

关键词：

D O I：

10.1063/1.104305

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

C-12(alpha,-alpha)C-12, O-16(alpha,-alpha)O-16 resonances and the O-16(He-3,-alpha)O-15 nuclear reaction in situ analysis have been employed to study the influence of carbon on the reduction of CuO to Cu2O. Significant oxygen loss from CuO starts in the presence of carbon at 250-degrees-C. During in situ annealing of a CuO film, CO2 was detected by mass spectrometry. The combination of carbon and oxygen atoms to form CO2 at the carbon/copper oxide interface is the limiting step to the enhanced oxygen loss rate from CuO thin films.

引用

页码：1344 / 1346

页数：3

共 13 条

[1]

ABEL F, UNPUB

[2] THE USE OF THE 3.05 MEV OXYGEN RESONANCE FOR HE-4 BACKSCATTERING NEAR-SURFACE ANALYSIS OF OXYGEN-CONTAINING HIGH Z-COMPOUNDS [J].