RAMAN-SCATTERING BY PLASMON PHONON MODES IN HIGHLY DOPED N-INAS GROWN BY MOLECULAR-BEAM EPITAXY

被引:33
作者
LI, YB
FERGUSON, IT
STRADLING, RA
ZALLEN, R
机构
[1] UNIV LONDON IMPERIAL COLL SCI TECHNOL & MED,INTERDISCIPLINARY RES CTR SEMICOND MAT,LONDON SW7 2BZ,ENGLAND
[2] VIRGINIA POLYTECH INST & STATE UNIV,DEPT PHYS,BLACKSBURG,VA 24061
关键词
D O I
10.1088/0268-1242/7/9/002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Raman scattering by coupled plasmon-phonon modes is studied with Si-doped InAs epilayers grown by MBE with carrier concentrations from 7.5 x 10(17) cm-3 to 4 x 10(19) cm-3. Unexpectedly, an unscreened LO line is observed throughout the whole carrier concentration range together with a low frequency (L-) line arising from wavevector dependent LO phonon-plasmon coupling. The frequency of the L- branch lies between the LO and TO phonon frequencies and approaches the TO frequency asymptotically from the high-frequency side as the carrier concentration increases. This behaviour is attributed to competition between screening (dominant in the high-density limit) and large-wavevector induced decoupling. The L+ branch of the plasmon-phonon system is observed for the first time in Raman experiments with InAs.
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收藏
页码:1149 / 1154
页数:6
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