THE EFFECT OF DEPOSITION RATE ON THE ELECTRICAL-RESISTIVITY OF THIN MANGANESE FILMS

被引：14

作者：

SHIVAPRASAD, SM

ANGADI, MA

机构：

来源：

关键词：

D O I：

10.1088/0022-3727/13/8/003

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L157 / L159

页数：3

共 10 条

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[5] TEMPERATURE COEFFICIENT OF RESISTANCE IN THIN VANADIUM FILMS [J].

JAIN, SC ;

CHANDER, R .

[6]

LARSON D, 1971, PHYS THIN FILMS, P85

[7]

NEUGEBAUER CA, 1964, PHYSICS THIN FILMS, V2, P11

[8]

SHIVAPRASAD SM, UNPUBLISHED

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[10]

1973, HDB CHEM PHYSICS, pF155