GALVANOMAGNETIC PROPERTIES OF SINGLE-CRYSTAL BISMUTH-ANTIMONY THIN-FILMS

被引:29
作者
MORELLI, DT
PARTIN, DL
HEREMANS, J
机构
[1] Dept. of Phys., Gen. Motors Res. Lab., Warren, MI
关键词
D O I
10.1088/0268-1242/5/3S/056
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Describes growth of the first thin ( approximately 1 mu m) epitaxial films of pure bismuth-antimony alloys using molecular beam epitaxy techniques. These structures were grown at elevated temperatures on single-crystal barium fluoride substrates of (111) orientation. Electron microscope observations show the films to be featureless and defect-free on the scale of 0.1 mu m. The films grow with their trigonal axis parallel to the (111) axis of the substrate, and Laue-backscattering pictures show that they are epitaxial. Mobilities of alloys with x=0 are of the order of 2 m2 V-1 s-1 at room temperature and increase to over 10 at 20 K and 100 at liquid helium temperatures. These values are far superior to those of other bismuth films grown to data, and approach mobilities observed in single-crystal bismuth. The dependence of energy gap and c axis lattice constant on x is different from that in bulk alloys, which may be due to the effects of strain arising from the 3.6% lattice mismatch between sample and substrate.
引用
收藏
页码:S257 / S259
页数:3
相关论文
共 14 条
  • [1] Lutskii VN, Sov. Phys.-JETP Lett., 2, (1985)
  • [2] Takaoka S, Murase K, J. Phys. Soc. Japan, 54, 6, (1985)
  • [3] Jain AL, Phys. Rev., 114, (1959)
  • [4] Agassi D, Chu TK, Appl. Phys. Lett., 51, 26, (1987)
  • [5] Korenman V, Drew HD, Phys. Rev., 35, 12, (1987)
  • [6] Doezema RE, Drew HD, Phys. Rev. Lett., 57, 6, (1986)
  • [7] Partin DL, J. Electron. Mater., 10, 2, (1981)
  • [8] Salamanca-Young L
  • [9] Garcia N, Kao YH, Strongin M, Phys. Rev., 5, (1972)
  • [10] Shin S-C, Ketterson JB, Hilliard JE, Phys. Rev., 30, 7, (1984)