VAPOR GROWTH-KINETICS OF ALPHA-HGI2 CRYSTALS

被引：17

作者：

ISSHIKI, M ^{[1
]}

PIECHOTKA, M ^{[1
]}

KALDIS, E ^{[1
]}

机构：

[1] SWISS FED INST TECHNOL,FESTKORPERPHYS LAB,CH-8093 ZURICH,SWITZERLAND

来源：

JOURNAL OF CRYSTAL GROWTH | 1990年 / 102卷 / 1-2期

关键词：

D O I：

10.1016/0022-0248(90)90920-G

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：344 / 348

页数：5

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MUHEIM, JT ;

WAEGLI, P ;

KALDIS, E .

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[5]

OMALI J, 1981, MAT RES B, V18, P785

[6] STUDY OF THE CRYSTALLINE GROWTH OF HGI2 (ALPHA) USING THE VAPOR-PHASE AND IN A SEALED TUBE [J].

OMALY, J ;

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[7]

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[8] VAPOR GROWTH OF HGI-2 BY PERIODIC SOURCE OR CRYSTAL TEMPERATURE OSCILLATION [J].

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SCHNEPPLE, WF ;

VANDENBERG, L .

JOURNAL OF CRYSTAL GROWTH, 1976, 33 (01) :125-135

[9]

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[10]

SCHOLZ H, 1974, ACTA ELECTRONICS, V17, P69

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