RF SPUTTER ETCHING - A UNIVERSAL ETCH

被引:29
作者
DAVIDSE, PD
机构
关键词
D O I
10.1149/1.2411707
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:100 / &
相关论文
共 7 条
[1]  
BECKERMAN M, 1961, 8 T NAT VAC S AM VAC, P905
[2]   DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J].
DAVIDSE, PD ;
MAISSEL, LI .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :574-&
[3]  
DUGDALE RA, 1966, T BRIT CER SOC, V65, P165
[4]  
LEPSELTER MP, 1966, BELL SYSTEM TECH J, V45, P247
[5]  
SPIVAK GV, 1953, DOKL AKAD NAUK SSSR+, V88, P511
[6]  
SPIVAK GV, 1957, DOKL AKAD NAUK SSSR+, V114, P1001
[7]  
1962, P7 KOD IND DAT BOOK, P17