SUB-0.2-MU-M LITHOGRAPHY BY USING A VARIABLE-SHAPED ELECTRON-BEAM ASSISTED BY A FOCUSED ION-BEAM PROCESS

被引：2

作者：

HOSONO, K

MINAMI, H

KUSUNOSE, H

FUJINO, T

NAGAHAMA, K

MORIMOTO, H

WATAKABE, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584645

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2044 / 2047

页数：4

共 5 条

[1] PERFORMANCE OF A 20-200 KV FOCUSED-ION-BEAM SYSTEM WITH A NEW OPTICAL DESIGN CONCEPT [J].

AIHARA, R ;

SAWARAGI, H ;

MORIMOTO, H ;

HOSONO, K ;

SASAKI, Y ;

KATO, T ;

SHEARER, MH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :245-248

[2]

ASAI S, 1987, IEEE MTT, P1019

[3]

HOSONO K, 1988, J VAC SCI TECHNOL B, P1828

[4] SUPER LOW-NOISE HEMT USING FOCUSED ION-BEAM LITHOGRAPHY [J].

NAGAHAMA, K ;

NAKANISHI, M ;

SASAKI, Y ;

HOSONO, K ;

MORIMOTO, H ;

KATOH, T ;

HIRANO, R ;

MUROTANI, T ;

KAWAGISHI, A .

ELECTRONICS LETTERS, 1988, 24 (04) :242-243

[5]

SHEARER MH, 1988, P SPIE, V923, P290

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