LITHOGRAPHIC APPROACH FOR 100-NM FABRICATION BY FOCUSED ION-BEAM

被引：47

作者：

MATSUI, S ^{[1
]}

MORI, K ^{[1
]}

SAIGO, K ^{[1
]}

SHIOKAWA, T ^{[1
]}

TOYODA, K ^{[1
]}

NAMBA, S ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 351,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 04期

关键词：

D O I：

10.1116/1.583524

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：845 / 849

页数：5

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