学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
CONTACT POTENTIAL VARIATIONS ON FRESHLY CONDENSED METAL FILMS AT LOW PRESSURES
被引:11
作者
:
ANTES, LL
论文数:
0
引用数:
0
h-index:
0
ANTES, LL
HACKERMAN, N
论文数:
0
引用数:
0
h-index:
0
HACKERMAN, N
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1951年
/ 22卷
/ 12期
关键词
:
D O I
:
10.1063/1.1699880
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1395 / 1398
页数:4
相关论文
共 5 条
[1]
ADAM NK, 1941, PHYSICS CHEM SURFACE
[2]
DANIELS FB, 1937, PHYS REV, V52, P1200
[3]
DUBOIS E, 1930, ANN PHYS, V14, P627
[4]
Mignolet J, 1950, DISCUSS FARADAY SOC, V8, P326
[5]
A new method of measuring contact potential differences in metals
Zisman, WA
论文数:
0
引用数:
0
h-index:
0
机构:
Harvard Univ, Jefferson Phys Lab, Cambridge, MA USA
Harvard Univ, Jefferson Phys Lab, Cambridge, MA USA
Zisman, WA
[J].
REVIEW OF SCIENTIFIC INSTRUMENTS,
1932,
3
(07)
: 367
-
370
←
1
→
共 5 条
[1]
ADAM NK, 1941, PHYSICS CHEM SURFACE
[2]
DANIELS FB, 1937, PHYS REV, V52, P1200
[3]
DUBOIS E, 1930, ANN PHYS, V14, P627
[4]
Mignolet J, 1950, DISCUSS FARADAY SOC, V8, P326
[5]
A new method of measuring contact potential differences in metals
Zisman, WA
论文数:
0
引用数:
0
h-index:
0
机构:
Harvard Univ, Jefferson Phys Lab, Cambridge, MA USA
Harvard Univ, Jefferson Phys Lab, Cambridge, MA USA
Zisman, WA
[J].
REVIEW OF SCIENTIFIC INSTRUMENTS,
1932,
3
(07)
: 367
-
370
←
1
→