ELLIPSOMETRIC EXAMINATION OF ION-PLATED CHROMIUM FILMS IN THE VISIBLE SPECTRAL RANGE

被引：3

作者：

IDCZAK, E ^{[1
]}

OLESZKIEWICZ, E ^{[1
]}

TANCULA, M ^{[1
]}

机构：

[1] POLYTECH INST WROCLAW,INST ELECTRON TECHNOL,PL-50370 WROCLAW,POLAND

来源：

关键词：

D O I：

10.1016/0040-6090(80)90549-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L21 / L23

页数：3

共 11 条

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TOPA, V
[J]. THIN SOLID FILMS, 1979, 58 (01) : 217 - 221
[3] GORSHKOV MM, 1974, ELIPSOMETRYA
[4] INFLUENCE OF THE DEPOSITION PARAMETERS ON THE STRUCTURE OF ION-PLATED CHROMIUM
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[J]. THIN SOLID FILMS, 1979, 58 (01) : 121 - 125
[5] THE OPTICAL PROPERTIES OF CHROMIUM
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[6] IDCZAK E, 1976, 249 TU WROCL I PHYS
[7] A NEW MODIFICATION OF CHROMIUM
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[J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1965, 20 (10) : 1963 - &
[8] AN ELECTRON DIFFRACTION STUDY ON CRYSTAL STRUCTURE OF A NEW MODIFICATION OF CHROMIUM
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NISHIDA, I
[J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1967, 22 (03) : 744 - &
[9] MENDRELA E, 1978, TECHNIKA JONOWA, V13, P109
[10] OLESZKIEWICZ E, 1979, THESIS TU WROCLAW WR