DISLOCATIONS AND PRECIPITATES IN GALLIUM-ARSENIDE

被引:25
作者
SCHLOSSMACHER, P [1 ]
URBAN, K [1 ]
RUFER, H [1 ]
机构
[1] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, W-5170 JULICH, GERMANY
关键词
D O I
10.1063/1.351346
中图分类号
O59 [应用物理学];
学科分类号
摘要
A complete dislocation analysis on a large number of grown-in dislocations was performed on wafers taken from three different semi-insulating liquid encapsulation Czochralski GaAs single crystals. By determining the Burgers vector, line direction, and habit plane of nearly 800 dislocations a decision could be made on dislocation type, dislocation generation, and multiplication mechanisms. Taking into account possible dislocation reactions between stress-induced glide systems all detected glide systems could be explained. The influence of post-growth annealing on both dislocations and arsenic precipitates was also investigated. Little effect was found on dislocations. Arsenic precipitates, however, showed a different distribution in size and significant effects on fine structure giving information on their nucleation and growth mechanisms.
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收藏
页码:620 / 629
页数:10
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