THERMAL-FIELD-EMISSION ELECTRON OPTICS FOR NANOLITHOGRAPHY

被引：13

作者：

GESLEY, M ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 03期

关键词：

D O I：

10.1063/1.342993

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：914 / 926

页数：13

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