A NEW TECHNIQUE FOR INSITU MEASUREMENTS OF EROSION AND REDEPOSITION IN A SINGLE DISCHARGE

被引:3
作者
WESCHENFELDER, F
WIENHOLD, P
WINTER, J
机构
[1] Institut für Plasmaphysik, Forschungszentrum Jülich GmbH, D-5170 Jülich, Ass. EURATOM-KFA
关键词
D O I
10.1016/S0022-3115(06)80203-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on the very different refractive constants of quartz substrates (approximately 1.5) and of amorphous deposits (> 1.7) collected in the scrape-off layer of TEXTOR, in situ reflectometry has been developed in order to determine the growth rates. Laboratory experiments comparing the light intensities reflected from the rear side of the system glass/deposit to the theoretically calculated reflectivity demonstrate the feasibility of the technique. The optical constants needed are determined ex situ by ellipsometry. For the application to TEXTOR, the Stockholm TEXTOR collector probe system has been equipped with fibre optic light guides which end behind quartz substrates carried by a replaceable graphite head. This arrangement avoids disturbance due to vibrations or due to observations over long distances.
引用
收藏
页码:1101 / 1105
页数:5
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