PHOTON STATISTICS OF AN ARBITRARILY DETUNED 3-LEVEL 2-PHOTON MICROMASER

被引：2

作者：

BERGER, M

KNOLL, L

机构：

[1] Friedrich-Schiller-Universität Jena, Theoretisch-Physikalisches Institut, O- 6900 Jena

来源：

OPTICS COMMUNICATIONS | 1992年 / 94卷 / 05期

关键词：

D O I：

10.1016/0030-4018(92)90584-E

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A two-photon micromaser is investigated. Arbitrary detunings of the three atomic levels with respect to the cavity resonance frequency are included into calculations on the basis of the dressed-states formalism on one hand, and on the basis of adiabatic elimination of the middle atomic level on the other hand. The results for photon statistics and trapping states, following from these two methods, are presented in dependence of atomic level detuning and level occupation probabilities and are compared with each other.

引用

页码：417 / 427

页数：11

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