AN INSITU DIFFUSE REFLECTANCE FTIR INVESTIGATION OF PHOTOCATALYTIC DEGRADATION OF 4-CHLOROPHENOL ON A TIO2 POWDER SURFACE

被引:158
作者
STAFFORD, U [1 ]
GRAY, KA [1 ]
KAMAT, PV [1 ]
VARMA, A [1 ]
机构
[1] UNIV NOTRE DAME, NOTRE DAME RADIAT LAB, NOTRE DAME, IN 46556 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/0009-2614(93)85166-L
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An in situ FTIR technique has been employed to probe the adsorption and photocatalytic degradation of 4-chlorophenol (4-CP) on TiO2 particles in a gas/solid system. The chemisorbed 4-CP adsorbed on the TiO2 surface corresponds to a monolayer. The reaction has been followed under a number of conditions in order to investigate the roles of oxygen and water in the mechanism of 4-CP degradation. The rate of 4-CP disappearance was greatest under an oxygen atmosphere saturated with water and with UV irradiation. Under these conditions hydroquinone (HQ) was observed as a primary reaction inter-mediate and carbonates as the final product. Transformation of 4-CP to HQ was seen to occur under a variety of reaction conditions (i.e. O2/UV, N2/H2O/UV), but HQ degradation took place only in the presence of oxygen and UV irradiation. These results illustrate that the interactions of 4-CP at the semiconductor surface are complex and suggest that oxygen is intrinsically involved in the degradation reactions.
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页码:55 / 61
页数:7
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