A 4-POINT CRYSTAL BENDER FOR DISPERSIVE-X-RAY ABSORPTION-SPECTROSCOPY

被引：17

作者：

ALLEN, PG ^{[1
]}

CONRADSON, SD ^{[1
]}

PENNERHAHN, JE ^{[1
]}

机构：

[1] UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1993年 / 26卷

关键词：

D O I：

10.1107/S0021889892009038

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new crystal bender for dispersive X-ray absorption fine-structure spectroscopy (XAFS) has been built and its performance characterized. The bender employs an adjustable four-point bending mechanism and a contoured crystal, which makes it possible to produce an excellent approximation of the ideal elliptical bend from 8000 to 20 000 eV with a single such Si (220) crystal. With the near-elliptical optics, it is possible to achieve a focus size of 175 mum with a 5 mm source and simultaneously to achieve a useful bandpass of 700 at 9000, 1200 at 11 500 and 2000 eV at 18 000 eV. The upper limit on the resolution, which is dictated by the finite source size in this configuration, is 2-5 eV for all of the energy ranges studied.

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页码：172 / 179

页数：8

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