NEW LINES IN THE UV - SRS OF EXCIMER LASER WAVELENGTHS

被引：84

作者：

LOREE, TR

SZE, RC

BARKER, DL

SCOTT, PB

机构：

[1] Los Alamos Scientific Laboratory, University of California, Los Alamos

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1979年 / 15卷 / 05期

关键词：

D O I：

10.1109/JQE.1979.1070016

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The UV excimer lasers ArF, KrCI, KrF, and XeCl were utilized to create new families of UV lines by multiple orders of broadband nonresonant stimulated Raman scattering (SRS). in the media H2, D2, CH4, and LN2. Mixed-media and excited-state SRS were also studied. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.

引用

页码：337 / 342

页数：6

共 26 条

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