GATE CURRENT IN OFF-STATE MOSFET

被引:18
作者
CHEN, J
CHAN, TY
KO, PK
HU, CM
机构
关键词
D O I
10.1109/55.31721
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:203 / 205
页数:3
相关论文
共 12 条
[1]   A NEW 3-TERMINAL TUNNEL DEVICE [J].
BANERJEE, S ;
RICHARDSON, W ;
COLEMAN, J ;
CHATTERJEE, A .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (08) :347-349
[2]  
Chan T. Y., 1987, IEDM TECH DIG, P718
[3]   A TRUE SINGLE-TRANSISTOR OXIDE-NITRIDE-OXIDE EEPROM DEVICE [J].
CHAN, TY ;
YOUNG, KK ;
HU, CM .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (03) :93-95
[4]   DRAIN-AVALANCHE AND HOLE-TRAPPING INDUCED GATE LEAKAGE IN THIN-OXIDE MOS DEVICES [J].
CHANG, C ;
HADDAD, S ;
SWAMINATHAN, B ;
LIEN, J .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (11) :588-590
[5]  
Chang C., 1987, IEDM TECH DIG, P714
[6]   SUB-BREAKDOWN DRAIN LEAKAGE CURRENT IN MOSFET [J].
CHEN, J ;
CHAN, TY ;
CHEN, IC ;
KO, PK ;
HU, C .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (11) :515-517
[7]   TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS [J].
CROWELL, CR ;
SZE, SM .
APPLIED PHYSICS LETTERS, 1966, 9 (06) :242-&
[8]  
LENZILINGER M, 1969, J APPL PHYS, V40, P218
[9]  
MATSUOKA H, 1988, 20TH C SOL STAT DEV, P589
[10]   HIGH-FIELD AND CURRENT-INDUCED POSITIVE CHARGE IN THERMAL SIO2 LAYERS [J].
NISSANCOHEN, Y ;
SHAPPIR, J ;
FROHMANBENTCHKOWSKY, D .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) :2830-2839