FINE-STRUCTURE BRANCHING IN THE NEAR-THRESHOLD PHOTODISSOCIATION OF NAK (XI-SIGMA+-B-1-PI)

被引：15

作者：

WANG, JX

KLEIBER, PD

SANDO, KM

STWALLEY, WC

机构：

[1] UNIV IOWA, DEPT CHEM, IOWA CITY, IA 52242 USA

[2] UNIV IOWA, CTR LASER SCI & ENGN, IOWA CITY, IA 52242 USA

来源：

PHYSICAL REVIEW A | 1990年 / 42卷 / 09期

关键词：

D O I：

10.1103/PhysRevA.42.5352

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have measured the X 1+B1 bound-free molecular photodissociation profile of NaK under molecular-beam conditions. The dissociation results in excited K*(4 2P). We have measured the D1/D2 fine-structure branching ratio; this ratio is a strong function of wavelength ranging from near zero to D1/D225% as the laser is tuned through the bound-free absorption profile. © 1990 The American Physical Society.

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页码：5352 / 5356

页数：5

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