INFLUENCE OF NUCLEATING SURFACE ON SPUTTERED ZNO THIN-FILMS

被引：16

作者：

HILLMAN, GD ^{[1
]}

SEGUIN, HJJ ^{[1
]}

机构：

[1] UNIV ALBERTA,DEPT ELECT ENGN,EDMONTON,ALBERTA,CANADA

来源：

关键词：

D O I：

10.1063/1.1662086

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5053 / 5055

页数：3

共 9 条

[1] FAHMY AH, 1972, IEEE T SONICS ULTRAS, VSU19, P346
[2] CRYSTALLOGRAPHIC ORIENTATION OF ZINC OXIDE FILMS DEPOSITED BY TRIODE SPUTTERING
FOSTER, NF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 111 - &
[3] DEPOSITION AND PIEZOELECTRIC CHARACTERISTICS OF SPUTTERED LITHIUM NIOBATE FILMS
FOSTER, NF
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 420 - +
[4] PIEZOELECTRIC TRANSDUCER MATERIALS
JAFFE, H
BERLINCOURT, DA
[J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1965, 53 (10): : 1372 - +
[5] KLERK JD, 1964, APPL PHYS LETT, V5, P2
[6] KLERK JD, 1965, REV SCI INSTRUM, V36, P506
[7] EPITAXIAL THIN FILMS OF ZNO ON CDS AND SAPPHIRE
ROZGONYI, GA
POLITO, WJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 115 - &
[8] SITTIG EK, 1969, J APPL PHYS, V40, P4341
[9] WINSLOW DK, 1969, J VAC SCI TECHNOL, V6, P111