ON THE PHOTOLYSIS OF PHTHALIC-ACID DIALKYL ESTERS - A PRODUCT ANALYSIS STUDY

被引：16

作者：

HIZAL, G ^{[1
]}

ZHU, QQ ^{[1
]}

FISCHER, CH ^{[1
]}

FRITZ, PM ^{[1
]}

SCHNABEL, W ^{[1
]}

机构：

[1] HAHN MEITNER INST BERLIN GMBH,BEREICH S,GLIENICKER STR 100,W-1000 BERLIN 39,GERMANY

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 1993年 / 72卷 / 02期

关键词：

D O I：

10.1016/1010-6030(93)85021-Y

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The following phthalic acid dialkyl esters were subjected to UV irradiation (lambda(inc) = 254 nm at 22-degrees-C or lambda(inc) = 240-440 nm at 40-degrees-C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GC-MS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: phi less-than-or-equal-to 0.03. Extension of the linear alcohol chains decreases the stability: phi(-DMP)<phi(-DNOP)<phi(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: phi(-DOP)< phi(-DNOP).

引用

页码：147 / 152

页数：6

共 11 条

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HIZAL, G ;

ZHU, QQ ;

FISCHER, CH ;

MAJIMA, T ;

SCHNABEL, W .

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