INTERCONNECTION LINES FOLLOWING THE SURFACE-TOPOGRAPHY FABRICATED BY WRITING FOCUSED ION-BEAM IMPLANTATION

被引：10

作者：

BISCHOFF, L

TEICHERT, J

HESSE, E

机构：

[1] Research Center Rossendorf Inc. Institute of Ion Beam Physics and Materials Research, D - 01314 Dresden

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)00123-C

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The Rossendorf Focused Ion Beam IMSA-100 was used for writing Co-implantation over a topographical structured surface with a partly controlled focus. After a subsequent annealing the resulting CoSi2 interconnection lines were analysed by SEM and electrical measurements. Also the influence of the depth of focus on the height of the surface contours as well as the resulting radial beam profiles were investigated.

引用

页码：351 / 354

页数：4

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