MICROSTRUCTURE, RESISTIVITY AND THE ANISOTROPY OF THE UPPER CRITICAL-FIELD IN NBN THIN-FILMS

被引：12

作者：

RUDMAN, DA

JUANG, JY

VANDOVER, RB

NAKAHARA, S

CAPONE, DW

TALVACCHIO, J

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

[2] ARGONNE NATL LAB,ARGONNE,IL 60439

[3] WESTINGHOUSE ELECT CORP,CTR RES & DEV,PITTSBURGH,PA 15235

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1987年 / 23卷 / 02期

关键词：

D O I：

10.1109/TMAG.1987.1065011

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：831 / 838

页数：8

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