VAPOR-DEPOSITED FILMS AND INDUSTRIAL APPLICATIONS

[1] Deb S K, 1969, Appl Opt, V8 Suppl 1, P192

[2] FAUGHNAN BW, 1975, RCA REV, V36, P177

[3] FRELLER H, UNPUBLISHED

[4] GUNTHER KG, 1962, SIEMENS Z, V36, P728

[5] HINTERMANN HE, 1972, 3RD P INT C CVD, P352

[6] ELECTROCHROMISM IN HYDRATED TUNGSTEN-OXIDE FILMS [J]. ELECTRONICS LETTERS, 1975, 11 (07) : 142 - 144

[7] KNITTL Z, 1976, OPTICS THIN FILMS, P11

[8] MAISSEL LI, 1970, HDB THIN FILM TECHNO, P18

[9] MUNSTER A, 1953, Z ELEKTROCHEM, V57, P564

[10] RUNK R, 1976, J ELECTROCHEM SOC, V123, P285

[1] Deb S K, 1969, Appl Opt, V8 Suppl 1, P192

[2] FAUGHNAN BW, 1975, RCA REV, V36, P177

[3] FRELLER H, UNPUBLISHED

[4] GUNTHER KG, 1962, SIEMENS Z, V36, P728

[5] HINTERMANN HE, 1972, 3RD P INT C CVD, P352

[6] ELECTROCHROMISM IN HYDRATED TUNGSTEN-OXIDE FILMS [J]. ELECTRONICS LETTERS, 1975, 11 (07) : 142 - 144

[7] KNITTL Z, 1976, OPTICS THIN FILMS, P11

[8] MAISSEL LI, 1970, HDB THIN FILM TECHNO, P18

[9] MUNSTER A, 1953, Z ELEKTROCHEM, V57, P564

[10] RUNK R, 1976, J ELECTROCHEM SOC, V123, P285