RELAXATION PHENOMENA IN PLANAR GE(LI) DETECTORS

被引:9
作者
WEBB, PP
机构
[1] RCA Victor Company, Ltd., Research Laboratories, Montreal
关键词
D O I
10.1109/TNS.1968.4324953
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A study has been made of the changes in net impurity concentration which occur when Ge(Li) diodes are allowed to remain unbiased at or near room temperature (termed relaxation), and when subjected to reheat cycles. The changes occur too rapidly to be explained in terms of lithium diffusion at the junction edges. Capacitance measurements have been used to determine impurity concentration profiles, and y-ray scanning techniques used to locate junction positions. It has been shown that a reheat at 4000C causes the compensated region to become slightly n-type. On the other hand, a device allowed to remain unbiased at room temperature becomes more or less uniformly p-type. Inthe samples studied (twelve diodes made from geranium from four different suppliers) ‘generation’ rates of acceptors at230C varied from approximately 4x 100to 4 x1010/cm3/hour. Since a well compensated diode has a net impurity concentration less than 1010 /cm3, this implies that in many diodes the degree of compensation changes substantially in a few hours. Copyright © 1968 by The Institute of Electrical and Electronics Engineers, Inc.
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页码:321 / &
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[1]   CHEMICAL INTERACTIONS AMONG DEFECTS IN GERMANIUM AND SILICON [J].
REISS, H ;
FULLER, CS ;
MORIN, FJ .
BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (03) :535-636