SYNTHESIS OF ALKALI-SOLUBLE SILICONE RESIN SUITABLE FOR RESIST MATERIAL IN MICROLITHOGRAPHY

被引：15

作者：

BAN, H ^{[1
]}

TANAKA, A ^{[1
]}

KAWAI, Y ^{[1
]}

IMAMURA, S ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, BASIC RES LABS, MUSASHINO, TOKYO 180, JAPAN

来源：

POLYMER | 1990年 / 31卷 / 03期

关键词：

acetylated phenylsilsesquioxane; Friedel Crafts acetylation; lithography; oligomer; phenylsilsesquioxane; resist; silicone; two-layer resist;

D O I：

10.1016/0032-3861(90)90403-L

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

An alkali-soluble silicone resin, acetylated phenylsilsesquioxane oligomer (APSQ), was synthesized from phenylsilsesquioxane oligomer by Friedel Crafts acetylation. Silanol groups are simultaneously formed in APSQ through this acetylation. The presence of silanol groups makes APSQ soluble in alkaline aqueous solutions. Silicone-based results composed of APSQ and sensitizers were prepared for ultraviolet (u.v.), deep u.v., electron beam and X-ray lithographies. These resists based on APSQ can be developed with alkaline aqueous solutions and have high resistance to oxygen reactive ion etching. © 1990.

引用

页码：564 / 568

页数：5

共 11 条

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