MECHANISMS FOR ANNEALING OF ION-BOMBARDMENT-INDUCED DEFECTS ON PT(111)

被引:54
作者
POELSEMA, B
KUNKEL, R
VERHEIJ, LK
COMSA, G
机构
[1] Institut F̈r Grenzflächenforschung und Vakuumphysik, Forschungszentrun J̈lich, Postfach 1913
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 16期
关键词
D O I
10.1103/PhysRevB.41.11609
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The morphology of a Pt(111) crystal during bombardment with 600-eV Ar+ ions has been investigated at constant temperatures Ts with thermal-energy atom scattering. Below Ts600 K the formation of three-dimensional (3D) structures is observed, while above Ts700 K the removal proceeds layer by layer. From the quantitative modeling of the data we infer that 3D structures develop when annealing proceeds only by intralayer diffusion of vacancies, while layer-by-layer removal is observed when interlayer mass transport also becomes effective. The latter process is believed to be related to the onset of meandering (roughening) of atomic steps. © 1990 The American Physical Society.
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收藏
页码:11609 / 11611
页数:3
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