THE GEOMETRY FACTOR IN PHOTOPROCESSES ON IRREGULAR (FRACTAL) SURFACES .1. STATIC CONSIDERATIONS

被引：54

作者：

AVNIR, D ^{[1
]}

机构：

[1] HEBREW UNIV JERUSALEM,F HABER RES CTR MOLEC DYNAM,IL-91904 JERUSALEM,ISRAEL

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1987年 / 109卷 / 10期

关键词：

D O I：

10.1021/ja00244a014

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：2931 / 2938

页数：8

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