Maskless nonlinear lithography with femtosecond laser pulses

被引：52

作者：

Koch, J. ^{[1
]}

Fadeeva, E. ^{[1
]}

Engelbrecht, M. ^{[1
]}

Ruffert, C. ^{[2
]}

Gatzen, H.H. ^{[2
]}

Ostendorf, A. ^{[1
]}

Chichkov, B.N. ^{[1
]}

机构：

[1] Laser Zentrum Hannover E.V., 30419 Hannover

[2] Institute for Microtechnology, Hanover University, 30823 Garbsen

来源：

Applied Physics A: Materials Science and Processing | 2006年 / 82卷 / 1 SPEC. ISS.期

关键词：

D O I：

10.1007/s00339-005-3418-7

中图分类号：

学科分类号：

摘要：

Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small-scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution - whereas the limit of achievable structure sizes is predicted to be below 100nm - it is attractive to use this technique for maskless lithography. In this paper, we present the first results on super-resolution femtosecond laser lithography, which show great potential for future applications.

引用

页码：23 / 26

页数：3