A study of ultrafast electron diffusion kinetics in ultrashort-pulse laser ablation of metals

被引：14

作者：

Key Laboratory of Opto-Electronic Information Science and Technology, Nankai University, Education Ministry of China, Tianjin 300071, China ^{[1
]}

不详 ^{[2
]}

机构：

[1] Key Laboratory of Opto-Electronic Information Science and Technology, Nankai University, Education Ministry of China

[2] Department de Physique, de Genie Physique et d'Optique, Centre d'Optique, Photonique et Laser, Universite Laval

来源：

Chin. Phys. | 2007年 / 7卷 / 2003-2010期

关键词：

Ablation; Electron diffusion; Femtosecond pulse;

D O I：

10.1088/1009-1963/16/7/033

中图分类号：

学科分类号：

摘要：

Temperature dependence of the electron diffusion in metallic targets, where the electron-electron collision is the dominant process, is investigated with the help of an extended two-temperature model. In sharp contrast to the low electron temperature case, where only the electron-phonon collisions are commonly considered, the electron diffusion process underlying the high electron temperatures evolves dramatically different in both temporal and spatial domains. Calculated results of the ablation yield at different pulse durations are presented for a copper plate impinged by ultrashort laser pulses with energy fluences ranging from 0.1 J/cm2 to 10 J/cm2. The excellent agreement between the simulation results and the experimental data indicates the significant role of electron-electron collisions in material ablations using intense ultrashort laser pulses. © 2007 Chin. Phys. Soc. and IOP Publishing Ltd.

引用

页码：2003 / 2010

页数：7

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