NANOSECOND RESOLVED X-RAY DIFFRACTION DURING PULSED LASER ANNEALING OF SILICON.

被引:13
作者
Mills, D.M.
Larson, B.C.
White, C.W.
Noggle, T.S.
机构
来源
| 1983年 / 208期
关键词
LASER BEAMS - Applications - SILICON AND ALLOYS - Heat Treatment;
D O I
10.1016/0167-5087(83)91174-2
中图分类号
学科分类号
摘要
The pulsed nature of the X-rays emitted from the Cornell High Energy Synchrotron (CHESS) was utilized to carry out a diffraction study of the near-surface structure and temperature of silicon following pulsed ruby laser annealing. To the knowledge of the authors this was the first temporal X-ray diffraction investigation of a system at the nanosecond timescale. In this paper experimental details are described concerning the synchronization of the laser with the X-ray bursts along with a description of the data collection technique and experimental results.
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页码:1 / 3
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