Composition and microstructure of CVD-C, SiC coating on SiC fiber

被引:2
作者
Li, J.X. [1 ]
Matsuo, Yohtaro [1 ]
Kimura, Shiushichi [1 ]
机构
[1] Tokyo Inst of Technology, Tokyo, Japan
来源
Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan | 1991年 / 99卷 / 1155期
关键词
Carbon - Microstructure - Carbon - Vapor Deposition - Chemical Vapor Deposition - Microscopic Examination - Scanning Electron Microscopy - Morphology - Silicon Carbide - Thermal Effects - X-Ray Analysis;
D O I
10.2109/jcersj.99.1129
中图分类号
学科分类号
摘要
Nicalon-SiC fibers were coated with C, SiC at 1200°C and 1300°C by chemical vapor deposition to improve the thermal stability of the fibers and to modify fiber-matrix interface. A coating layer having thickness of 0.1-25 μm was obtained by controlling the CVD conditions. According to the AES and SEM analyses, a carbon rich layer (0.1-0.5 μm) was deposited on the fiber surface initially. Nuclei of silicon carbide were formed on the surface of the carbon rich layer and finally whiskers or domed grains of silicon carbide were grown. The deposition rates of the carbon rich layer and silicon carbide layer was about 0.02 μm/min and 0.65 μm/min, respectively. It was observed by XRD and TEM that domed grains, which were the mixtures of β-SiC and small amount of α-SiC, consisted of subgrains and contained stacking faults in high density.
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页码:1129 / 1134
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