Low field-induced electron emission phenomenon observed from the carbon containing thin films

被引：17

作者：

Chen, Jun ^{[1
]}

Wei, Ai-Xiang ^{[1
]}

Zhang, Hai-Yan ^{[1
]}

Lu, Yong ^{[1
]}

Zheng, Xin-Guo ^{[1
]}

Mo, Dang ^{[1
]}

Peng, Shao-Qi ^{[1
]}

Xu, Ning-Sheng ^{[1
]}

机构：

[1] Department of Physics, Zhongshan University, Guangzhou 510275, China

来源：

| 1997年 / IOP Publishing Ltd卷 / 14期

关键词：

Amorphous films - Thin films - Film thickness - Carbon films - Current voltage characteristics;

D O I：

10.1088/0256-307X/14/12/019

中图分类号：

学科分类号：

摘要：

Stable cold-cathode electron emission at fields as low as 3 MV/m has been observed from two types of carbon-containing thin film of thickness in submicron scale, i. e., non-doped fullerene C60 and amorphous diamond films. A transparent anode imaging technique was used to record the spatial distribution of individual sites and the total emission current-voltage characteristic of the films. It is found that supplemental measurements of optical spectra and electrical conductivity of the films can provide important evidence useful for understanding the differences in emission behaviour between two types of film. © 1997 by Allerton Press, Inc.

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